Marvellous Realism is the first and largest exhibition of African photography in Asia. Curated by Ekow Eshun, project led by Lucy MacGarry, and proudly presented by Fotografiska in partnership with the KT Wong Foundation, will open in Shanghai on 30 August 2024. The exhibition is founded on an awareness of how the rich and diverse contemporary art and cultural scenes in Africa remain largely unknown to the Chinese public, in spite of the importance of long-standing economic and political relationships.
ABOUT THE EXHIBITION
Marvellous Realism is the first and largest exhibition of African photography in Asia. Curated by Ekow Eshun, project led by Lucy MacGarry, and proudly presented by Fotografiska in partnership with the KT Wong Foundation, will open in Shanghai on 30 August 2024. The exhibition is founded on an awareness of how the rich and diverse contemporary art and cultural scenes in Africa remain largely unknown to the Chinese public, in spite of the importance of long-standing economic and political relationships.
The featured artists in the exhibition invoke Africa as an innately cosmopolitan condition that is closer in kind to the philosopher Achille Mbembe’s description of the continent as ‘a body in motion born out of overlapping genealogies, at the intersections of multiple encounters with multiple elsewheres.’
Lady Linda Wong Davies, founder of the KT Wong Foundation and co-organizer of Marvellous Realism said:
“We are thrilled to have conceived this vitally important show promoting China-Africa cultural relations and collaborate with these wonderful co-curators to bring this to life - never before in Asia have we been witness to an exhibition that seeks above all to nurture greater awareness and understanding of these culturally beneficial relations through this fascinating art medium, rethink prejudices about China and Africa and promote the fertile creative potential Africa can offer to the rest of the world.”
The show will premiere in Fotografiska Shanghai, the museum brings to Marvellous Realism a deep knowledge of photography and its history and evolution. The partnership builds upon Fotografiska’s proud legacy of showcasing world-class, genre-defying artists of all backgrounds, in immersive environments, creating powerful and unparalleled exhibitions, spanning various photographic genres. In addition to the exhibition, which will run until 1st December 2024, a specific focus will be on celebrating African culture through cultural a programme of diverse cultural programming.
“Inspiring new perspectives is a core mission of Fotografiska and we are thrilled to be able to showcase to our Chinese audience how smart, relevant and inspiring contemporary African artists are.” says Christian Devillers – Managing Director of Fotografiska Shanghai.
THE 16 FEATURED ARTISTS INCLUDE:
Gallery artists
Ruby Okoro (Nigeria)
David Ụzọchukwu (Nigeria, Austria)
And
Leonce Raphael Agbodjelou (Benin)
Atong Atem (South Sudan)
Justin Dingwall (South Africa)
Maïmouna Guerresi (Senegal, Italy)
Hassan Hajjaj (Morocco)
Ayana V. Jackson (South Africa, USA)
Cyrus Kabiru (Kenya)
Lebohang Khanye (South Africa)
Michael MacGarry (South Africa)
Mohau Modisakeng (South Africa)
Zanele Muholi (South Africa)
Thania Peterson (South Africa)
Micha Serraf (Zimbabwe)
Mary Sibande (South Africa)
